| 摘要 |
A polishing pad for polishing curved surfaces has a pad element having an axis, a central opening adjoining the axis and forming an inner edge, and an outer peripheral edge, first engaging means provided on the outer peripheral edge for engaging an outer periphery of a curved supporting body, and second engaging means provided on the inner edge of the pad element and engageable with a central opening of the curved supporting body, the first and second engaging means being harder than the pad element.
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