发明名称 SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing device which prevents leakage of mist-like cleaning liquid to an outside and does not cause entering of particles from the outside. SOLUTION: A fan 9 which rotates integrally with a rotating shaft 4 is fixed to the rotating shaft 4, and air flow in an area near a through hole 5a outside a cover 5 is generated in a direction perpendicular to an extension direction of the rotating shaft 4 in a direction toward a circumferential direction of the rotating shaft 4. Consequently, the mist-like cleaning liquid existing in an area near the through hole 5a outside the cover 5 is guided along the inner wall of a casing 6, and the mist-like cleaning liquid is prevented from leaking outside from the through hole 6a of the casing 6. Furthermore, air which is about to enter from an outside toward the through hole 5a of the cover 5 is also guided toward the circumferential direction of the rotating shaft 4, and prevents particles from entering inside the cover 5. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006073938(A) 申请公布日期 2006.03.16
申请号 JP20040258509 申请日期 2004.09.06
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SHINOHARA MASAKI
分类号 H01L21/304;B08B1/04;B08B5/04;G02F1/13;G02F1/1333 主分类号 H01L21/304
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