发明名称 METHOD OF FABRICATING DONOR SUBSTRATE FOR LASER INDUCED THERMAL IMAGING AND METHOD OF FABRICATING ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a device and a method of fabricating a donor substrate for a laser induced thermal imaging (LITI) and to provide a method of fabricating an organic electroluminescent display (OELD) device using the same. <P>SOLUTION: The device of fabricating a donor substrate for a LITI comprises: a vacuum chamber; a donor substrate which moves in line and passes through an inside of the vacuum chamber; and a depositing device arranged in the vacuum chamber and forming a transfer layer on the donor substrate. The method of fabricating the donor substrate for the LITI and the method of fabricating the OELD device using the same comprise: making a donor substrate move in line and pass through a vacuum chamber; and making a depositing device arranged in the vacuum chamber form a transfer layer on the donor substrate. The present invention has advantages such that the transfer layer, particularly the monomer organic light emitting layer, can be continuously formed in the vacuum chamber which maintains the high vacuum, and the donor substrate for the LITI having the transfer layer can be mass-produced. Also, the large size OELD device can be fabricated using the donor substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006070357(A) 申请公布日期 2006.03.16
申请号 JP20040377844 申请日期 2004.12.27
申请人 SAMSUNG SDI CO LTD 发明人 KIM MU HYUN;SONG MYUNG-WON;CHIN BYUNG DOO;LEE SEONG-TAEK
分类号 C23C14/56;B41M5/382;B41M5/392;B41M5/40;B41M5/41;B41M5/46;G03F7/34;H01L51/50;H05B33/10 主分类号 C23C14/56
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