发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To improve resistance characteristics against a shock while the deterioration of the shearing strength of a semiconductor device is suppressed. <P>SOLUTION: A semiconductor chip 14 is mounted on a carrier substrate 11 in which a conductive pattern 12c is formed. A half slit 19 is formed on the connecting surface of a land 12a formed on the rear surface of the carrier substrate 11. A projecting electrode 18 is connected to the land 12a. The projecting electrode 18 is connected to a land 2 formed on a mother board 1. Thereby, the carrier substrate 11 is mounted on the mother board 1. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006073953(A) 申请公布日期 2006.03.16
申请号 JP20040258739 申请日期 2004.09.06
申请人 SEIKO EPSON CORP 发明人 OTSUKI TETSUYA
分类号 H01L23/12;H01L21/60 主分类号 H01L23/12
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