发明名称 SEMICONDUCTOR APPARATUS AND METHOD FOR MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor apparatus which can secure a reliability in the structure of a fuse by preventing a yield reduction by laser trimming, and also to provide a method for manufacturing the semiconductor apparatus. <P>SOLUTION: In the semiconductor apparatus, a metallic fuse wiring line for memory relief is mounted; and an SiCN film 05, an inter-via-layer insulating film 06, and a passivation film are formed on the fuse wiring line 01. Thereafter, the passivation film is removed by etching, and the inter-via-layer insulating film 06 is removed by etch-back. As a result, only the SiCN film 05 remains on the fuse wiring line 01. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006073891(A) 申请公布日期 2006.03.16
申请号 JP20040257403 申请日期 2004.09.03
申请人 RENESAS TECHNOLOGY CORP 发明人 TAWA SHIGERO
分类号 H01L21/82;H01L21/3205;H01L21/8242;H01L23/52;H01L27/10;H01L27/108 主分类号 H01L21/82
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