Support system for a treatment apparatus

摘要

A system for an apparatus of the type adapted to treat substrates and/or wafers is described and comprises a stationary base element ( 600 ) and a movable support ( 610 ) for at least one substrate or at least one wafer, the support being rotatable above the element ( 600 ) about a stationary axis; a chamber ( 610 ), and at least one duct ( 608 ) is provided for the admission of at least one gas-flow to the chamber ( 604 ) in order to raise the support ( 610 ); the system also comprises means ( 605 ) for converting the flow of gas into the chamber ( 604 ) into rotation of the support ( 610 ).