RESIST COMPOSITION AND PROCESS FOR FORMATION OF RESIST PATTERNS

摘要

A resist composition which comprises (A) a base component that has acid-dissociable dissolution-inhibiting groups and can be increased in the alkali solubility by the action of acid, (B) an acid generating component that can generate an acid on being exposed to light, and (C) an organic solvent and which is obtained by dissolving the components (A) and (B) in the solvent (C), characterized in that the component (A) contains (A1) a blocked polyhydric phenol derived from (a) a polyhydric phenol which bears two or more phenolic hydroxyl groups and has a molecular weight of 300 to 2500 by blocking the phenolic hydroxyl groups partially or completely with acid-dissociable dissolution-inhibiting groups and that the solvent (C) contains an alcohol.