| 摘要 |
<p>This invention provides a method and apparatus for inspecting defects and attachment position of an attached OVD without any influence of a change in the pattern of the OVD due to fluttering or undulation during conveyance of the printed product. Image input means and illumination means are arranged at positions where mirror-reflected light and diffracted light from the OVD have values equal to or less than a threshold value upon a binarization process by image processing means. The illumination means irradiates the surface of a base material with infrared rays or light containing infrared rays. The image input means inputs image data including a wave range of 650 [nm] or more from a region including the OVD attached to the base material. The storage means stores, in advance, reference image data of an OVD serving as a standard or the reference image data and data indicating a reference position and also stores the input image data. Image processing means executes the binarization process, compares the image data with the reference image data or the image data with the reference image data and the data indicating the reference position, and determines the acceptability of at least one of the form, area, and position of the OVD attached to the base material on the basis of a comparison result.</p> |
