发明名称 Substrate dividing method
摘要 A substrate dividing method which can thin and divide a substrate while preventing chipping and cracking from occurring. This substrate dividing method comprises the steps of irradiating a semiconductor substrate 1 having a front face 3 formed with functional devices 19 with laser light while positioning a light-converging point within the substrate, so as to form a modified region including a molten processed region due to multiphoton absorption within the semiconductor substrate 1, and causing the modified region including the molten processed region to form a starting point region for cutting; and grinding a rear face 21 of the semiconductor substrate 1 after the step of forming the starting point region for cutting such that the semiconductor substrate 1 attains a predetermined thickness.
申请公布号 EP1635390(A2) 申请公布日期 2006.03.15
申请号 EP20050077644 申请日期 2003.03.06
申请人 HAMAMATSU PHOTONICS K. K. 发明人 FUJII, YOSHIMARO;FUKUYO, FUMITSUGU;FUKUMITSU, KENSHI;UCHIYAMA, NAOKI
分类号 B23K26/38;H01L21/78;B23K26/00;B23K26/06;B23K26/40;B23K101/40;H01L21/26;H01L21/30;H01L21/301;H01L21/324;H01L21/42;H01L21/46;H01L21/477;H05K3/00 主分类号 B23K26/38
代理机构 代理人
主权项
地址