发明名称 |
IN-MOLD DUAL SHOT MASKING |
摘要 |
A method of selectively applying a pattern to a molded part comprises the steps of forming a mold (8); molding a three-dimensional object (10) having at least one face (12) in the mold, the three-dimensional object (10) being formed of a first material. Masking the at least the one face (12) of the three-dimensional object (10) with a mask (14) comprising a reverse image of a desired pattern while the three-dimensional object is still in the mold. Overmolding the three-dimensional object (10) with a second material to provide the reverse image. Removing the three-dimensional object (10) from t he mold, coating at least the one face 12 of the three-dimensional object with a thir d material; and removing the second material to reveal the desired image.
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申请公布号 |
CA2510687(A1) |
申请公布日期 |
2006.03.15 |
申请号 |
CA20052510687 |
申请日期 |
2005.06.27 |
申请人 |
VALEO SYLVANIA L.L.C. |
发明人 |
SKIRHA, DIRK-MARTIN, III;MORRIS, KEVIN P.;BROTT, SANDERS R. |
分类号 |
B29C70/72;B05D1/32 |
主分类号 |
B29C70/72 |
代理机构 |
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地址 |
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