EXPOSURE APPARATUS FOR SUBMICRON PATTERN,申请号KR20040047247-传众专利搜索

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发明名称	EXPOSURE APPARATUS FOR SUBMICRON PATTERN
摘要
申请公布号	KR100560295(B1)	申请公布日期	2006.03.10
申请号	KR20040047247	申请日期	2004.06.23
申请人		发明人
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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