发明名称 IMPROVED ANTISTATIC PROPERTIES FOR THERMALLY DEVELOPABLE MATERIALS
摘要 <p>The use of metal antimonates at high metal antimonate to binder ratios in buried backside conductive layers of thermographic and photothermographic materials allows the use of thin backside overcoat layers. The combination provides antistatic constructions having excellent antistatic properties that show less change in resistivity with changes in humidity. The thin backside overcoat layer serves to protect the buried antistatic layer.</p>
申请公布号 WO2006026147(A1) 申请公布日期 2006.03.09
申请号 WO2005US29043 申请日期 2005.08.16
申请人 EASTMAN KODAK COMPANY;LUDEMANN, THOMAS, JAY;LABELLE, GARY, ELZEAR;PHILIP, DARLENE, FAYE;KOESTNER, ROLAND, JOHN;BHAVE, APARNA, VASANT 发明人 LUDEMANN, THOMAS, JAY;LABELLE, GARY, ELZEAR;PHILIP, DARLENE, FAYE;KOESTNER, ROLAND, JOHN;BHAVE, APARNA, VASANT
分类号 G03C1/85;B41M5/32;B41M5/40;G03C1/498;G03C1/76 主分类号 G03C1/85
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