发明名称 METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE, ACTIVE MATRIX SUBSTRATE, ELECTRO-OPTICAL DEVICE AND ELECTRONIC EQUIPMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an active matrix substrate and a method for manufacturing the substrate for suppressing decrease in a light transmissive area in a pixel part, and to provide an electro-optical device and an electronic equipment. <P>SOLUTION: The active matrix substrate 20 has wirings 40, 42 in a grid pattern on a substrate P, pixel electrodes 45 placed in regions surrounded by the wirings 40, 42, and capacitive lines 46 placed between the substrate P and the pixel electrodes 45. The capacitive lines 46 are made approximately transparent. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006065019(A) 申请公布日期 2006.03.09
申请号 JP20040247918 申请日期 2004.08.27
申请人 SEIKO EPSON CORP 发明人 NODA YOICHI
分类号 G09F9/30;G02F1/1368;H01L51/50 主分类号 G09F9/30
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