发明名称 THIN FILM MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a thin film manufacturing method capable of degrading the surface activity by electrochemically increasing the hydrophobicity of surfactant. SOLUTION: In the thin film manufacturing method, when hydrophobic substance is deposited on the surface of a substrate in water by performing reduction of surfactant after dissolving the hydrophobic substance in water or dispersing the substance as particles in water by using the surfactant, hydrophobicity of the surfactant is increased by the reduction, and the hydrophobic substance is de-dissolved or de-dispersed in a vicinity of the surface of the substrate thereby. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006063372(A) 申请公布日期 2006.03.09
申请号 JP20040245803 申请日期 2004.08.25
申请人 TOKYO INSTITUTE OF TECHNOLOGY 发明人 SAJI TETSUO
分类号 C23C18/16;B05D1/18 主分类号 C23C18/16
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