发明名称 SUBSTRATS POUR SYSTEMES CONTRAINTS ET PROCEDE DE CROISSANCE CRISTALLINE SUR UN TEL SUBSTRAT
摘要 <p>A stress absorbing microstructure assembly including a support substrate having an accommodation layer that has plurality of motifs engraved or etched in a surface, a buffer layer and a nucleation layer. The stress absorbing microstructure assembly may also include an insulating layer between the buffer layer and the nucleation layer. This assembly can receive thick epitaxial layers thereon with concern of causing cracking of such layers.</p>
申请公布号 FR2855650(B1) 申请公布日期 2006.03.03
申请号 FR20030006568 申请日期 2003.05.30
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 LETERTRE FABRICE;GHYSELEN BRUNO;RAYSSAC OLIVIER
分类号 H01L21/20;B81C1/00;H01L21/762 主分类号 H01L21/20
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