发明名称 Wiring substrate and semiconductor device using the same
摘要 A wiring substrate provides an inner wiring substrate having through hole portions. On at least one main surface of the inner wiring substrate, a plurality of build up layers are laminated. The build up layers have a stacked via, for example, as a power source system via. The stacked via is formed by stacking the vias in multiple steps to form a straight line. The stacked via has a large diameter via which is larger than other via constituting the stacked via, or is constituted of large diameter vias larger than other via in the same build up layer.
申请公布号 US2006046464(A1) 申请公布日期 2006.03.02
申请号 US20050211712 申请日期 2005.08.26
申请人 MIURA MASAYUKI;KATO KATSUTO;IKEBE HIROSHI 发明人 MIURA MASAYUKI;KATO KATSUTO;IKEBE HIROSHI
分类号 H01L21/4763 主分类号 H01L21/4763
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