发明名称 |
Characterizing flare of a projection lens |
摘要 |
Flare of an imaging system is measured using resist by employing the imaging system to directly expose a first part of the resist at an image plane of the imaging system to a first dose of radiation and to indirectly expose a second part of the resist as a result of flare. The imaging system exposes the second part of the resist to a second dose of radiation. Flare of the imaging system is determined from a pattern that is formed in the second part of the resist.
|
申请公布号 |
US2006046167(A1) |
申请公布日期 |
2006.03.02 |
申请号 |
US20040933090 |
申请日期 |
2004.09.01 |
申请人 |
WU BO;SEZGINER ABDURRAHMAN;ZACH FRANZ X |
发明人 |
WU BO;SEZGINER ABDURRAHMAN;ZACH FRANZ X. |
分类号 |
G03C5/00 |
主分类号 |
G03C5/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|