| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a design tool which improves manufacturability of a design, namely, gives such a design that a fabricated wafer more exactly meets intended/assumed/modeled properties, at lower manufacturing cost and risk. <P>SOLUTION: A design system for designing complex integrated circuits (ICs), a method of IC design, and program products therefor are provided. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data preparatory unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
