发明名称 |
STAGE APPARATUS AND EXPOSURE APPARATUS |
摘要 |
<p>A stage apparatus wherein a movable part, which holds an object and is driven along a guide member, is reduced in sizes and weight, and vibration caused while the movable part is being driven is not easily transmitted to the object. The stage apparatus is provided with a Y axis guide (33Y) and an X axis guide (33X) arranged to orthogonally intersect each other at the upper part of a guide plane (31a); a Y axis slider (39) and an X axis slider (40) which move along the guides; and a wafer stage (WST) connected to the Y axis slider (39) and the X axis slider (40) to hold a wafer (W). The Y axis slider (39) and the X axis slider (40) are connected by a connecting member having a flexible structure.</p> |
申请公布号 |
WO2006022200(A1) |
申请公布日期 |
2006.03.02 |
申请号 |
WO2005JP15128 |
申请日期 |
2005.08.19 |
申请人 |
NIKON CORPORATION;EBIHARA, AKIMITSU |
发明人 |
EBIHARA, AKIMITSU |
分类号 |
H01L21/027;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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