发明名称 SURFACE COMPRISING A MICROSTRUCTURE THAT REDUCES ADHESION AND ASSOCIATED PRODUCTION METHOD
摘要 The invention relates to a surface comprising a microstructure that reduces adhesion and to a method for producing said microstructure. Microstructures of this type that reduce adhesion are known and are used, for example, to configure self-cleaning surfaces that use the Lotus effect. According to the invention, the surface is produced electrochemically by means of reverse pulse plating, the known microstructure being first produced and a nanostructure that is overlaid on the microstructure is produced at the same time or in a subsequent step. To achieve this for example, the pulse length of the current pulse that is used during the reverse pulse plating lies in the millisecond range and has a pulse length ratio greater than 1:3 (anodic:cathodic). The microstructure that has been produced, consisting of peaks (19) and troughs (20) is then overlaid with peaks (19n) and troughs (20n) of a smaller size order belonging to the nanostructure, thus permitting the Lotus effect that is achieved by the surface to be greatly improved.
申请公布号 WO2006021507(A1) 申请公布日期 2006.03.02
申请号 WO2005EP53902 申请日期 2005.08.08
申请人 SIEMENS AKTIENGESELLSCHAFT;HANSEN, CHRISTIAN;KRUEGER, URSUS;SCHNEIDER, MANUELA 发明人 HANSEN, CHRISTIAN;KRUEGER, URSUS;SCHNEIDER, MANUELA
分类号 C25D5/18 主分类号 C25D5/18
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