| 摘要 |
PROBLEM TO BE SOLVED: To provide a spectral film thickness measuring device capable of shortening a time for film thickness measurement of one substrate by processing a plurality of data by one-time measurement. SOLUTION: In this spectral film thickness measuring device, the film thickness of a resist or the like inside a color pattern or in a patternless part of a liquid crystal color filter substrate B is measured, and a spectral characteristic thereof is measured. Measuring light L1 is emitted from one light source device 1 toward a plurality of measuring parts. Each reflected light L2 from the plurality of measuring parts enters an imaging spectroscope 12, and each reflected light is spectrally diffracted respectively individually. COPYRIGHT: (C)2006,JPO&NCIPI
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