发明名称 SUBSTRATE POSITIONING MECHANISM, SUBSTRATE POSITIONING METHOD, SUBSTRATE CARRYING APPARATUS AND IMAGE FORMING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate positioning mechanism and a substrate positioning method for positioning a substrate in a simple structure while preventing deformation or damages in the substrate, and to provide a substrate carrying apparatus equipped with the substrate positioning mechanism, and an image recording apparatus equipped with the substrate carrying apparatus. <P>SOLUTION: A top end positioning unit 50 disposed in the downstream side of a carrying support roller 16 in the carrying direction includes a plurality of sensor holders 52 and a holding block 54 integrally holding the sensor holders 52. When the substrate material 200 is detected by a positioning sensor 62 mounted on the sensor holder 52, a ball screw 59 is rotated by a top end positioning motor 60 to move the top end positioning unit 50 in the downstream side of the carrying direction. This reduces the contact pressure on touching and prevents deformation or damages in the substrate material 200. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006058784(A) 申请公布日期 2006.03.02
申请号 JP20040242705 申请日期 2004.08.23
申请人 FUJI PHOTO FILM CO LTD 发明人 KOIZUMI TAKASHI
分类号 G03F7/20;H05K3/00 主分类号 G03F7/20
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