发明名称 RESIST APPLICATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a means for carrying out a resist application of a substantially uniform film thickness while preventing the generation of pinholes even if a workpiece has unevenness. <P>SOLUTION: Resist particulates mixed with a gas are sprayed in a misty form from a nozzle 1, and applied to the workpiece W. The speed of the air current carrying the sprayed resist particulates is made to a high speed so that the Reynolds Number Re before the impinging to the workpiece W may reach beyond 4,300. Further, particle Reynolds Number Re' is made to be over 0.27. Re and Re' are calculated by (v&times;d)/&gamma;, where v is the speed of the air current (mm/sec) carrying the resist particulates, which is calculated by N/&pi;(L&times;tan&theta;)<SP>2</SP>[wherein N is a gas flow rate (mm<SP>3</SP>/sec), L is a distance (mm) from the nozzle to the workpiece, and &theta; is a spread angle (&deg;) of the sprayed resist]. Further, in the calculation of Re, the distance L is used as the d, and in the calculation of Re', a resist particle diameter D is used. Furthermore, &gamma; is a gas dynamic viscosity (mm<SP>2</SP>/sec). <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006055756(A) 申请公布日期 2006.03.02
申请号 JP20040240574 申请日期 2004.08.20
申请人 TOHOKU UNIV;USHIO INC 发明人 SASAKI MINORU;HANE KAZUHIRO;VIJAY KUMAR SINGH;WATANABE YOSHIHIKO
分类号 B05D3/00;B05D1/02;G03F7/16;H01L21/027 主分类号 B05D3/00
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