APPARATUS FOR CORRECTING LAYOUT PATTERN, METHOD FOR CORRECTING LAYOUT PATTERN, PROGRAM, STORAGE MEDIUM, METHOD FOR MANUFACTURING RETICLE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To remove fine irregularities formed due to optical proximity correction related to width, with excellent precision.

SOLUTION: The optical proximity effect related to width is corrected by parallelly sliding a first outline 12 forming a corner 13 to the outside and parallelly sliding a second outline 11 forming the corner 13 to the inside in a layout pattern 10 in the design stage of the inside of a semiconductor device. Then, a nearly rectangular protrusion 13a which is formed on the corner 13 and has the same width 12 as the slide amount of the first outline 12 and the same height as the slide amount L1 of the second outline 11 is detected, and the protrusion 13a is eliminated from the corner.

COPYRIGHT: (C)2006,JPO&NCIPI