发明名称 |
METHOD FOR MANUFACTURING DISTRIBUTED DENSITY MASK |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a distributed density mask with high production efficiency, in a small data amount and in a short drawing time when drawing the distributed density mask by an electron beam drawing apparatus. <P>SOLUTION: This method includes steps of: generating a plurality of outline pattern (P1) data representing contour lines of a three-dimensional shape (1); creating a plurality of tone pattern data for a tone pattern (P2) in the density corresponding to the respective contour lines (2); combining the outline pattern (P1) data and the corresponding tone pattern (P2) data to create a plurality of tone/outline pattern (P3) data by AND operation (3); subjecting the whole tone/outline pattern (P3) data to OR operation to create density distribution data (4); and drawing a mask (PM1) by an electron beam drawing apparatus using the density distribution data (5). <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
申请公布号 |
JP2006058865(A) |
申请公布日期 |
2006.03.02 |
申请号 |
JP20050206630 |
申请日期 |
2005.07.15 |
申请人 |
TOPPAN PRINTING CO LTD |
发明人 |
TOMIYAMA KEIICHI;NAKAMURA DAISUKE;IKEDA HIDEHIRO |
分类号 |
G03F1/00;G03F1/68;G03F1/78 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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