发明名称 Stress-compensation layers in contact arrays, and processes of making same
摘要 A stress-compensation layer is formed by pressing a solder bump into a compressible film within a mold chase. The stress-compensation layer flows against the solder bump and the compressible film such that at least a portion of the solder ball is embedded in the stress-compensation layer. The compressible film is removed to reveal at least a portion of the solder bump exposed and free of the stress-compensation layer. An article that exhibits a stress-compensation layer with a surface characteristic of the imposed flexible film is also included. A computing system that includes a stress-compensation layer with a surface characteristic of the imposed flexible film is also included.
申请公布号 US7005321(B2) 申请公布日期 2006.02.28
申请号 US20040815542 申请日期 2004.03.31
申请人 INTEL CORPORATION 发明人 CHEE CHOONG KOOI
分类号 H01L21/48;H01L21/4763;H01L21/56;H01L23/31;H01L23/498;H01L23/52 主分类号 H01L21/48
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