| 发明名称 |
Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition |
| 摘要 |
A compound which generates a sulfonic acid having one or more -SO<SUB>3</SUB>H groups and one or more -SO<SUB>2</SUB>- bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.
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| 申请公布号 |
US2006040203(A1) |
申请公布日期 |
2006.02.23 |
| 申请号 |
US20050056274 |
申请日期 |
2005.02.14 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KODAMA KUNIHIKO;WADA KENJI;IWATO KAORU |
| 分类号 |
G03C1/76 |
主分类号 |
G03C1/76 |
| 代理机构 |
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代理人 |
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| 主权项 |
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