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发明名称
APPARATUS FOR PROCESSING SUBSTRATE WITH PLASMA AND MAINTENANCE METHOD THEREOF
摘要
申请公布号
KR20060017351(A)
申请公布日期
2006.02.23
申请号
KR20040066006
申请日期
2004.08.20
申请人
ADP ENGINEERING CO., LTD.
发明人
LEE, YOUNG JONG;CHOI, JUN YOUNG;KIM, GYEONG HOON
分类号
H01L21/3065
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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