| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the contrast and DOF when forming patterns in arbitrary shapes. <P>SOLUTION: The photomask which is used to form patterns has the main pattern 101 on a light transmissive base plate 100 to transfer by exposing. The main pattern 101 is composed of: a 1st translucent section 101A to partially pass the exposure light; and a phase shifter 101B. A pair of auxiliary patterns 102 is provided at both sides of the main pattern 101 on the light transmissive base plate 100, diffracts the exposure light, but is not transferred by the exposure light. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
