| 摘要 |
PROBLEM TO BE SOLVED: To provide a sample for evaluating a nanolevel structural composition, its manufacturing method, and an evaluation method of the nanolevel structural composition wherein it is possible not only to prevent the charge-up in the sample having a multilayered thin film structure in which an insulating layer is interposed but also to evaluate a surface structure precisely. SOLUTION: A protruded sample part 2 comprises the multilayered thin film structure 3 having the insulating layer 4 interposed at least in a part thereof, and the whole surface of the surface area straddling at least the insulating layer 4 from the leading end part of the protruded sample part 2 of the sample for evaluating the nanolevel structural composition is covered with a conductive material 6 comprising a substance of which the evaporation electric field is lower than that of a conductive substance 5 for constituting a multilayered structure, to provide the sample for evaluating the nanolevel structural composition. COPYRIGHT: (C)2006,JPO&NCIPI
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