EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus capable of preventing a liquid from remaining on a measurement part and a device manufacturing method. The apparatus comprises a measurement system (60) having a first pattern (61) formed on the upper surface of a substrate stage and a second area (S2) specified near a first area (S1) including the first pattern (61) on the upper surface. A second pattern (80) is formed in the second area (S2) so that the liquid (LQ) remaining across the first area (S1) and the second area (S2) can be retreated from the first area (S1) and collected to the second area (S2).