| 摘要 |
PROBLEM TO BE SOLVED: To provide a single crystal MgO vapor deposition material used as a target material for depositing an MgO film on a substrate using a vacuum vapor deposition process including an electron beam vapor deposition process, in which the generation of splashes is prevented without reducing a film deposition rate during vapor deposition, and whose film properties such as discharge properties when used as a protective film for a PDP (Plasma Display Panel) are improved. SOLUTION: In the vapor deposition material composed of magnesium oxide single crystals, provided that the diameter of the equivalent circle of the maximum projection face is defined as D(m), the thickness in a direction vertical to the maximum projection face as t(m), and the volume as V(m<SP>3</SP>), D/t is≥4, t is≥0.4×10<SP>-3</SP>m, V is≥5×10<SP>-9</SP>m<SP>3</SP>, and also,≥90% of the total area of the maximum projection face is composed of at least one kind selected from the (100) face, (110) face and (111) face. COPYRIGHT: (C)2006,JPO&NCIPI
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