Photo mask, method of manufacturing the same and method of forming interconnection line in semiconudctor device using the photo mask,申请号KR20040054326-传众专利搜索

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发明名称	Photo mask, method of manufacturing the same and method of forming interconnection line in semiconudctor device using the photo mask
摘要
申请公布号	KR100552816(B1)	申请公布日期	2006.02.21
申请号	KR20040054326	申请日期	2004.07.13
申请人		发明人
分类号	H01L21/027;G03F1/28;G03F1/68;G03F7/20;H01L21/28;H01L21/768	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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