| 摘要 |
<p>A plurality of semiconductor elements have the same structure as a semiconductor element (for instance, pixel TFT) in a semiconductor element matrix region (110), such as a display pixel region. The semiconductor elements are formed as built-in inspecting elements, at the same time with the semiconductor element matrix (110). An inspecting wiring (100) is connected to the built-in inspecting elements, and the inspecting wiring (100) is led out to a terminal (101). At the time of inspecting a semiconductor array (TFT array) prior to forming a display element and the like, the built-in inspecting elements are operated, and based on a signal obtained by the terminal (101) through the inspecting wiring (100), characteristics of each element can be inspected. Thus, characteristic variance, such as display failure, due to a slight variance of a threshold of the semiconductor element, can be inspected even in a TFT array status prior to completion.</p> |
