| 摘要 |
PROBLEM TO BE SOLVED: To prevent atoms and molecules to be discharged from a wafer stored inside from being re-attached to the wafer in a closed wafer storage container such as an FOUP. SOLUTION: A p-doped polycrystalline silicon film is deposited on a wafer, the wafer is stored in an FOUPcuc, the FOUPcuc is closed and carried to a bay station BS, and the FOUPcuc is stored in the bay station BS. While the FOUPcuc is stored in the bay station BS, pipes PP are respectively attached to breezing filters formed at the two parts of the bottom face of the FOUPcuc, dry gas is made to flow from one pipe PP to the FOUPcuc, and atmosphere in the FOUPcuc is exhausted from the other pipe PP so that atmosphere in the FOUPcuc is ventilated. COPYRIGHT: (C)2006,JPO&NCIPI
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