Method of preparing slurry composition for chemical mechanical polishing

摘要

A method of preparing polishing particles by baking unmilled cerium compound in an environment having a temperature in a range between about 400-700° C., and without dropping the temperature in the environment, applying thermal stress to the resultant cerium oxide in-situ by heating the environment to a temperature in a range between about 700-800° C. to obtain cerium oxide particles.