| 摘要 |
A gas nozzle structure and a semiconductor manufacturing apparatus including the same are provided to arrange a plurality of injection holes at a gas ring by coupling a chamber lid and the gas ring with each other. A first body is connected to a gas supply source. A first gas buffer(104) and a plurality of gas paths(106) are formed in the inside of the first body. The first gas buffer shares gas supplied from a gas supply source. The gas paths are connected to the first gas buffer. A second body is coupled with the first body in order to be connected with the gas paths. The second body includes a plurality of injection holes(112) to inject the gas into the chamber. The injection holes are connected to the gas paths through a second gas buffer(114) formed between the first and second bodies.
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