发明名称 Plain surface stage apparatus
摘要 A plain surface stage apparatus includes a platen having a plain surface, stationary type supports comprising at least three supporting members, and displacement type supports, each of which supports the platen and forms a displacement type supporting point at a position other than those of supporting points formed by the stationary type supports, wherein the displacement type supports expand and contract in a direction perpendicular to the plain surface of the platen so as to be displaced, and holds a selected displaced state of the displacement type supports.
申请公布号 US6998738(B2) 申请公布日期 2006.02.14
申请号 US20030686636 申请日期 2003.10.17
申请人 USHIO DENKI KABUSHIKI KAISHA 发明人 TANAKA YONETA
分类号 G03F7/22;H02K41/00;G03F7/20;H01L21/027;H01L21/68;H02K41/03;H05K3/00 主分类号 G03F7/22
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