发明名称 |
COMPOSITIONS SUITABLE FOR REMOVING PHOTORESIST, PHOTORESIST BYPRODUCTS AND ETCHING RESIDUE, AND USE THEREOF |
摘要 |
Compositions containing certain amines and/or quaternary ammonium compounds, hydroxylamine, corrosion inhibitor, organic diluent and optionally water are capable of removing photoresist, photoresist byproducts and residue and etching residues from a substrate.
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申请公布号 |
KR20060014059(A) |
申请公布日期 |
2006.02.14 |
申请号 |
KR20057022394 |
申请日期 |
2004.05.24 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
RIEKER JENNIFER M.;WIEDER THOMAS;DURHAM DANA L. |
分类号 |
G03F7/26;B08B3/14;B08B7/00;C11D9/00;G03F7/30;G03F7/32;G03F7/42;H01L21/306;H01L21/311;H01L21/3213 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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