发明名称 Method of stress-testing an isolation gate in a dynamic random access memory
摘要 The present invention includes a DRAM array. The DRAM array includes a first memory cell, a second memory cell and an isolation gate formed between the first and second memory cells. The isolation gate is configured to provide electrical isolation between the first and second memory cells. The DRAM also includes a first switch having first and second load electrodes and a control electrode configured to accept a first control signal. The first load electrode is coupled to the isolation gate and the second load electrode is coupled to ground. The DRAM additionally includes a second switch having first and second load electrodes and a control electrode configured to accept a second control signal. The first load electrode is coupled to the isolation gate and the second load electrode is coupled to a stress voltage source.
申请公布号 US6999362(B2) 申请公布日期 2006.02.14
申请号 US20040974495 申请日期 2004.10.26
申请人 MICRON TECHNOLOGY, INC. 发明人 SIEK DAVID D.
分类号 G11C29/00;G11C11/404;G11C29/32;G11C29/50;H01L21/8242;H01L27/02;H01L27/108 主分类号 G11C29/00
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