| 摘要 |
A method of fabricating a color filter image sensor, comprising the following sequential steps. A structure having a first color filter layer formed thereover is provided. The first color filter layer is patterned to form at least one first color filter layer portion. A second color filter layer is formed over the structure and the at least one patterned first color filter layer portion. The second color filter layer is patterned to form at least one second color filter layer portion. A third color filter layer is formed over the structure, the at least one patterned first color filter layer portion and the at least one second color filter layer portion. The at least one third color filter layer is etched back to form: at least one third color filter layer portion; a planar upper surface common to all of the at least one first, second and third color filter layer portions. A microlens layer is formed over the planar upper surface to form the color filter image sensor.
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