| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which can favorably control the exposure width in a direction intersecting a scanning direction. <P>SOLUTION: The exposure apparatus carries out scanning exposure by synchronously moving a mask stage mounting a mask M2 and a substrate stage mounting a plate P2 in the scanning direction and is equipped with: partial projection optics PM1, PM3, PM5 in a first column disposed in a plurality of numbers as a first column at specified intervals in a direction intersecting the scanning direction so as to project a part of a mask pattern onto a plate; a partial projection optics PM4 or the like in a second column disposed in a plurality of numbers as a second column at a specified interval in the direction intersecting the scanning direction so as to project a part of the mask pattern onto a plate; shielding members 62a, 62b disposed at the ends in a direction intersecting the scanning direction so as to control the exposure width in a direction intersecting the scanning direction so as to block a part of the exposure light through the partial projection optics of the first column and a part of the exposure light through the partial projection optics of the second column; and driving units 64a, 64b to drive the light shielding members in a direction intersecting the scanning direction. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
