发明名称 THIN FILM AND DIFFRACTION OPTICAL ELEMENT AND THEIR MANUFACTURING METHODS
摘要 PROBLEM TO BE SOLVED: To provide a practical refractive index modulating type diffraction optical element inexpensively in a simple and easy manner. SOLUTION: In the manufacturing method for an diffraction optical element, a thin film (1) which includes carbon as a main component and has Knoop hardness that is greater than 30 and less than 200 and a refractive index≤1.54, is prepared and a plurality of regions (2a) of the thin film is irradiated with energy beams (4) in order to form a refractive index modulation structure for generating diffraction operation for the thin film and refractive index of these areas is increased. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006039392(A) 申请公布日期 2006.02.09
申请号 JP20040221990 申请日期 2004.07.29
申请人 SUMITOMO ELECTRIC IND LTD 发明人 ODA KAZUHIKO;MATSUURA TAKASHI;USHIRO TOSHIHIKO
分类号 G02B5/18 主分类号 G02B5/18
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