| 发明名称 |
PELLICLE AND METHOD FOR CORRECTING SHAPE OF PELLICLE PLATE |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pellicle plate for a pellicle suitable for a F<SB>2</SB>laser exposure mask. <P>SOLUTION: The pellicle comprises a pellicle frame and a pellicle plate adhering to one opening of the pellicle frame, wherein the pellicle plate is equipped with an external force applying means to apply external force to the pellicle plate to deform the pellicle plate into a desired shape. A method for correcting the shape of a pellicle plate is carried out by applying external force to the pellicle plate by an external force applying means provided on the pellicle plate to deform the pellicle plate into a desired shape. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
| 申请公布号 |
JP2006039409(A) |
申请公布日期 |
2006.02.09 |
| 申请号 |
JP20040222178 |
申请日期 |
2004.07.29 |
| 申请人 |
ASAHI GLASS CO LTD |
发明人 |
OKADA KANAME;OTA KAZUE;KIKUKAWA SHINYA;MISHIRO HITOSHI |
| 分类号 |
G03F1/62;G03F1/64;H01L21/027 |
主分类号 |
G03F1/62 |
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