| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer compound for a photoresist containing very small content of impurities such as metal components. <P>SOLUTION: This polymer compound for the photoresist is obtained by subjecting a monomer mixture, containing at least one kind of monomer selected from a monomer (a) containing a lactone skeleton, a monomer (b) containing a group releasable with an acid and becoming alkali-soluble, and a monomer (c) containing an alicyclic skeleton with a hydroxy group, to drop polymerization. By carrying out (i) an extraction step (B) subjecting the polymer obtained by the drop polymerization to an extracting operation using an organic solvent and water, or (ii) a filtration step (I) subjecting a specific polymer solution containing the polymer obtained by the drop polymerization to passing through a specific filter, the content of sodium is reduced to 95 wt.ppb or lower (based on the weight of polymer). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
