Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device

摘要

A pattern forming method including: (i) a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a Resin (P) including a non-acid-decomposable Repeating Unit (b1) represented by a following General Formula (b1) and a repeating unit including a group capable of being decomposed by acid and generating a polar group, and a Compound (B) capable of generating an acid through irradiation of actinic rays or irradiation; (ii) a process of exposing the film using actinic rays or radiation with a wavelength of equal to or less than 200 nm; and (iii) a process of developing the exposed film using a developer including an organic solvent containing a hetero atom and carbon atoms having 7 or more carbon atoms to forming a negative tone pattern.;

主权项

1. A pattern forming method comprising:
(i) a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing
a Resin (P) including a non-acid-decomposable Repeating Unit (b1) represented by the following General Formula (b1), a repeating unit including a group capable of being decomposed by acid and generating a polar group, and a repeating unit having a lactone structure in an amount of from greater than 0 mol % to 10 mol % or less with respect to all the repeating units within the Resin (P), anda Compound (B) capable of generating an acid through irradiation of actinic rays or irradiation; (ii) a process of exposing the film using actinic rays or radiation with a wavelength of equal to or less than 200 nm; and (iii) a process of developing the exposed film using a developer including an organic solvent containing a hetero atom and having 7 or more carbon atoms to form a negative tone pattern: in the formula, A represents an alicyclic hydrocarbon group including no oxygen atoms, and X0 represents a hydrogen atom or an alkyl group.