发明名称 ANTISTATIC ELECTRONIC DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electronic device that not only shows a good characteristic in any of antistatic treatment, adhesiveness, pattern formability and the like but also protects dielectric elements from electrostatic hazards such as ESD, and to provide a method for manufacturing the electronic device. SOLUTION: In an electronic device, an antistatic precursor layer containing materials that can be patternized by active energy rays is formed, an antistatic material layer is formed on the antistatic precursor layer, and an antistatic material is impregnated into the antistatic precursor layer from the antistatic material layer to form the antistatic precursor layer as an antistatic layer. Then, the antistatic material layer is removed from the electronic device with a solution capable of resolving the antistatic material layer, active energy rays are radiated to patternize the antistatic layer, and the patternized antistatic layer is formed by development processing. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006041346(A) 申请公布日期 2006.02.09
申请号 JP20040221651 申请日期 2004.07.29
申请人 FUJITSU LTD 发明人 OGINO TAKESHI;WATABE KEIJI;TAKEI FUMIO;AKUTSU SATOSHI
分类号 H01L23/00;G11B5/39;H01L43/08;H05F1/00 主分类号 H01L23/00
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