发明名称 alpha-UNSATURATED ACYLOXY-gamma-BUTYLOLACTONE DERIVATIVE, POLYMER COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST
摘要 <P>PROBLEM TO BE SOLVED: To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins. <P>SOLUTION: The &alpha;-unsaturated acyloxy-&gamma;-butylolactone derivative is represented by formula (1) (wherein R<SP>a</SP>is a hydrogen atom, a halogen atom, a 1-6C alkyl group or a 1-6C haloalkyl group; R<SP>b</SP>is a hydrocarbon group (except for a hydrocarbon group having a tertiary carbon atom at bonding position with adjacent oxygen atom); R<SP>1</SP>and R<SP>2</SP>are same or different and they are each a hydrocarbon group and R<SP>1</SP>and R<SP>2</SP>may mutually be combined to form a ring together with an adjacent carbon atom; R<SP>3</SP>and R<SP>4</SP>are same or different and they are each hydrogen atom or a hydrocarbon group). <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006036893(A) 申请公布日期 2006.02.09
申请号 JP20040217767 申请日期 2004.07.26
申请人 DAICEL CHEM IND LTD 发明人 KOYAMA YUTAKA;NISHIMURA MASAMICHI
分类号 C08F20/28;C07B61/00;C07D307/33;G03F7/033;G03F7/039 主分类号 C08F20/28
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