DC POWER SUPPLY UTILIZING REAL TIME ESTIMATION OF DYNAMIC IMPEDANCE
摘要
There is provided by this invention an apparatus and method for controlling a dc magnetron plasma processing system that automatically adjusts the control signal to the power supply based upon the dynamic impedance of the load to control the output power to the plasma. The output voltage and the output current of the power supply that supplies power to the plasma is sampled over at a sampling frequency at least four to five times higher than the switching frequency and the dynamic impedance of the plasma is calculated based upon the sampled voltage and current from the algorithm <i plasma</sub = </i ?</u V</u n</sub wherein ?V<sub n</sub
申请公布号
WO2006014215(A2)
申请公布日期
2006.02.09
申请号
WO2005US20393
申请日期
2005.06.09
申请人
ADVANCED ENERGY INDUSTRIES, INC.
发明人
ILIC, MILAN;SIDDABATTULA, KALYAN, N. C.;ROOP, GERALD, C., JR.;CHRISTIE, DAVID, J.