发明名称 SYSTEM AND METHOD TO MODIFY SPATIAL RESPONSE OF PATTERN GENERATOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a system and a method to modify the spatial response of a pattern generator. <P>SOLUTION: The method is characterized in that: (a) a material is directed to a layer of a pattern generator device to form a coating on the layer; and (b) at least a part of the material is prevented from reaching the layer in the step (a) so as to generate a trapezoidal profile of reflected light from the coating on the pattern generator. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006039566(A) 申请公布日期 2006.02.09
申请号 JP20050216007 申请日期 2005.07.26
申请人 ASML HOLDING NV 发明人 LIPSON MATTHEW;WILKLOW RONALD A
分类号 G03F1/08;C23C14/04 主分类号 G03F1/08
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