摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system and a method to modify the spatial response of a pattern generator. <P>SOLUTION: The method is characterized in that: (a) a material is directed to a layer of a pattern generator device to form a coating on the layer; and (b) at least a part of the material is prevented from reaching the layer in the step (a) so as to generate a trapezoidal profile of reflected light from the coating on the pattern generator. <P>COPYRIGHT: (C)2006,JPO&NCIPI |